Semiconductor wafer cleaning is required to remove particle and chemical contamination settled on the surface of the semiconductor. The cleaning process should be done in a manner to avoid any significant damage to the substrate later of the semiconductor.
Microelectronic cleaning plays a crucial role in the effective working of any electronic device. This, in turn, is expected to fuel semiconductor wafer cleaning equipment market during the forecast period.
To ensure cleaning without any damage, dry-physical, plasma, wet-physical, superficial fluid methods, and vapor phase are used. These processes avoid corrosion and roughness on the surface. There are wide array of equipment to execute the cleaning processes for integrated circuits.
Microelectronics cleaning equipment are used to clean printed circuit boards, silicon wafers, write/read heads of HD drives, flat panel displays, heads of HD drives, MEMS, photo masks and compound semiconductor device components. Integrated circuits fabrication industry is primary users. In the vertical, majority of the manufacturing processes require wafer cleaning.
While cleaning microelectronic, several technologies are implemented to remove the effect of contamination and defects on the components. The cleaning process involves the application of cryogenic aerosol, dry, aqueous, and wet chemical cleaning, and supercritical fluid. These techniques are also used in equipment that are used to process single wafer cleaning and batch wafer.
Growth in semiconductor industry, rising demand for smartphones and tablets, and inclination towards single-wafer processing are some of the major factors driving growth of the semiconductor wafer cleaning equipment market.
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Global Semiconductor Wafer Cleaning Equipment Market: Snapshot
The global semiconductor wafer cleaning equipment market is primarily being driven by a growing concern for upgrading and enhancing products and production standards in the semiconductor devices industry. Increasing device performance and reliability are core quality standards that the semiconductor industry goes by, and the global semiconductor wafer cleaning equipment market is an essential part of that process. The shift in technology types from conventional to single wafer processing is considered as one of the leading drivers of the global semiconductor wafer cleaning equipment market currently. Additionally, the growing demand for printed electronics and smart gadgets is another driving factor for the global semiconductor wafer cleaning equipment market. The increasing production of semiconductors in developing regions – especially the MEA region – is expected to provide key opportunities for participants over the coming years. However, the market is being stifled by the high capital required to get established in it.
The global semiconductor wafer cleaning equipment market was valued US$ 4.75 bn in 2018. Owing to growth factors such as the ones mentioned above, this market’s revenue is anticipated to reach USD 7.28 bn by the end of 2027, after expanding at a CAGR of 7.7% from 2019 to 2027.
Rotary Wafer Etching Systems Gather Top Share in Global Semiconductor Wafer Cleaning Equipment Market
The market is segmented into rotary wafer etching system and manual wet batch system, on the basis of equipment types. Rotary wafer etching systems accounted for the dominant share in terms of revenue in 2018, a factor attributed to the increasing application of wafer cleaning and processing equipment in manufacture of a growing array of smart gadgets such as smartphones and in-vehicle entertainment and guidance systems. The market is segmented on the basis of end users, into chemical contamination, metallic contamination, and particle contamination. Metallic and particle contamination processes were the dominant end users in the global semiconductor wafer cleaning equipment market for 2018.
The market can also be segmented by technology, among which etch cleaning technology was leading it in terms of revenue for 2018, followed by front side up cleaning technology. Rising advancement and technological development in the design and manufacture of semiconductor devices and a growing concern for adherence to production process standards is creating a higher demand for the global semiconductor wafer cleaning equipment market.
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APAC Leads Demand for Semiconductor Wafer Cleaning Equipment
Asia Pacific held the dominant share in the global semiconductor wafer cleaning equipment market for 2018, in terms of revenue. It is expected to maintain the leading position over coming years, followed by North America. Its lead is attributed to the growing production unit of semiconductor equipment. In addition, the growing need for portable consumer electronics devices and constantly evolving production quality standards are contributing to the development of the global semiconductor wafer cleaning equipment market. China dominated the market in terms of demand in 2018, within APAC, followed by Taiwan and Japan.
- Modutek Corporation (The U.S.)
- SCREEN Holdings Co., Ltd. (Japan)
- Speedline Technologies, Inc. (The U.S.)
- Lam Research Corporation (The U.S.)
- Falcon Process Systems (The U.S.)
- ONBoard Solutions Pty Ltd. (Australia)
- Cleaning Technologies Group (The U.S.)
- AP&S International GmbH (Germany)
- Tokyo Electron Limited (Japan)
were the leaders in the global semiconductor wafer cleaning equipment market for 2018.
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