There is no industry that is unaffected by the COVID-19 crisis, including the CMP slurry market. Silicon wafer suppliers are facing challenges due to volatile demand and supply. Apart from mission-critical projects pertaining to medical devices, FMCG (fast moving consumer goods) and defense, other sectors are witnessing temporary shutdown for production & other operations. Companies are adopting strategic business measures in countries such as Canada, India, Brazil, and Pakistan due to the second & third wave of the pandemic.
Current restriction protocols and preventive measures being implemented are altering routine business activities in the global CMP slurry market. As such, these measures are necessary to ensure safety of employees and workers in factories & offices. Despite an expected decrease in the demand for smartphones and other gadgets, a steady demand for silicon wafers is helping to keep economies running during the coronavirus pandemic.
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FCS Used for Characterization of Small Abrasive Particles in CMP Slurries
The fabrication of commercial integrated circuits depends on the physical and chemical properties of the abrasive slurry particles used to polish silicon wafer surfaces via CMP (chemical mechanical planarization) to near-atomic flatness. This has raised concern about the particle characterization challenge, which emerges from the combination of accurately sizing the nano-scale particles, while also identifying a relative few micron-scale aggregates. Hence, companies in the CMP slurry market are increasing their research in fluorescence correlation spectroscopy (FCS).
FCS is gaining prominence in particle size distribution (PSD) analysis methods, owing to its sensitivity to particles with hydrodynamic diameters in the nano-meter size range. Thus, the characterization of abrasive particles of smaller size in CMP slurries has become necessary as the feature sizes of integrated circuits steadily decrease according to Moore’s law.
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Improvements in Post-backgrind Wafer Polishing Services Lead to Higher Yields
Effective and safe semiconductor polishing processes are being preferred by clients in various end-use industries. Syagrus Systems – a specialist in post-fab wafer processing for semiconductors and electronics, is gaining recognition for its silicon wafer polishing services, which help to achieve high yields. There is a growing demand for post-backgrind wafer polishing services. This explains why the CMP slurry market is predicted to advance at a favorable CAGR of ~7% during the assessment period.
Companies in the CMP slurry market are gaining proficiency in wafer polishing processes suitable for dicing and is ideal for electronic applications requiring flexible circuits. They are using wafer stack support systems to polish and etch ultra-thin wafers without causing stress or damage, which helps clients to achieve higher yields.
Tungsten CMP Polishing Slurries Meet Extensive Technical Requirements of Customers
The CMP slurry market is projected to cross the revenue of US$ 2.6 Bn by 2031. CMC Materials – a global supplier of critical materials to semiconductor industry, is expanding its product portfolio in tungsten CMP polishing slurries that meet the performance requirements of all technology nodes and applications. Manufacturers are boosting their production capabilities in tungsten CMP polishing slurries made from high purity fumed silica combined with unique rate accelerating agents that help to meet international product quality standards.
Tungsten CMP polishing slurries are being produced by manufacturers in the CMP slurry market in order to meet the requirements of advanced node applications and deploy excellent removal rate. These slurries help to eliminate defectivity and topography for a wide variety of applications. On the other hand, aluminum, barrier, and copper CMP polishing slurries are being produced to meet extensive technical requirements of customers.
Two-component CMP Slurries Capable of Eliminating Surface Damaging Lapping Steps
Apart from barrier, copper and tungsten slurries, manufacturers in the CMP slurry market are boosting their output capacities in aluminum oxide and cerium oxide slurries. This is evident since aluminum oxide and cerium oxide slurries are predicted to expand at a CAGR of 7.6% and 6.9%, respectively.
Manufacturers in the CMP slurry market are unlocking revenue opportunities with silicon carbide (SiC) wafer polishing slurries. These slurries enable enhanced wafer throughput combined with excellent surface quality. SiC is emerging as the gold standard for diverse applications involving LED lighting, hybrid electric vehicles, and power electronic switches. Manufacturers are increasing the availability of two-component CMP slurries that deliver fast removal rates and establish rapid healing of sub-surface damage. These slurries have the capability to eliminate costly and surface damaging lapping steps.
Post-CMP Cleaning Solutions Help Manufacturers Gain Competitive Edge
Apart from CMP slurries, manufacturers are offering post-CMP cleaning products to gain a competitive edge over other market players. Merck Group – a German multinational science & technology company, is gaining popularity for its CMP solutions and its FLOWMASTER® CMP Chemical Delivery System, which facilitate precise delivery of post-CMP rinse chemical. Companies in the CMP slurry market are taking cues from such innovations to adopt chemical delivery systems that help to deliver the most uniform and accurate blend consistencies to the wafer.
Companies in the CMP slurry market are bolstering their production capabilities in advanced cleaning solutions that are acidic and non-fluorinated in nature. High performance post-CMP cleaning solutions are being engineered to remove trace metals, organics, and particle contaminants from copper. These solutions are being used for pad cleaning to extend pad life.
Use of Rigid Disk, Magnetic Head Slurries in High Volume Manufacturing
There is a growing demand for rigid disk and magnetic head slurries in the CMP slurry market. Manufacturers are boosting their production capabilities in these slurries to planarize glass substrates to ultra-low roughness and defects. Rigid disk and magnetic head slurries are helping the market to transition from high-density PMR disk drives to advanced MAMR/HAMR disk drives that are currently used by leading-edge disk drive customers in high volume manufacturing.
Manufacturers are boosting the availability of magnetic head slurries that are capable of polishing multiple materials in a single step. These slurries help to meet stringent surface topography and planarization requirements. Innovative CMP slurries offer multi-material polishing, tunable selectivity, and low defects. The ever-increasing demand for high computing performance is translating into incremental opportunities for CMP slurry manufacturers.
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